Most popular programs
Trending now
While not much time has passed since extreme ultraviolet radiation (EUV) might have been the most unknown range on the electromagnetic spectrum, it rapidly became the most important eneabler for the future of computing devices, starting with the smartphone, tablet, or laptop you currently use to read this text. In this course you will get to know EUV and its role in the semiconductor industry where EUV lithography is used to produce the smallest and most complex nanostructures used as integrated circuits. You will learn about the technological challenges that entailed the introduction of EUV into its current industrial application, from the search for a proper radiation source, the complexity of optical systems, and the necessity to put the whole system into vaccum tight chambers. Get fascinated by the sheer power of interdisciplinar research that allowed EUV technology to become one of the most important technologies of the 21st century and become part of our journey to push the limits of nanostructuring als well as nanometrology.
- Working principle, componentes and technological challenges of industrial EUV technology
- Principle and technologies of EUV radiation generation
- Basic priciples of light propagation and optics
- Types and applications of EUV optical components
- Concept and technology of photolithography
- Concept and technology of EUV metrology
Week 1: A comprehensive introduction to the motivation and basic principles for EUV technology with a deep dive into the
basics of (EUV) optics.
Week 2: After introducing the basic principles of radiation generation and radiation properties, the major source types for EUV radiation are introduced including a discussion on their advantages for different applications.
Week 3: The basic principles of optics are introduced with emphasis on principles necessary to understand the major optical components used in EUV optics.
Week 4: The major optical components used in EUV optical systems are introduced including multilayer and grazing incidence mirrors, pinholes, transmission filters, Fresnel zone plates, and diffraction gratings.
Week 5: Basic principles and realization of photolithography is introduced regarding its history up to the the current EUV projection lithography systems with digressions to other EUV and nanolithography techniques.
Week 6: Basic optical metrological principles and the relevant technological realizations are introduced. The realization and application of spectrometry, reflectometry, scatterometry, and microscopy using EUV as probing radiation is discussed.
Who can take this course?
Unfortunately, learners residing in one or more of the following countries or regions will not be able to register for this course: Iran, Cuba and the Crimea region of Ukraine. While edX has sought licenses from the U.S. Office of Foreign Assets Control (OFAC) to offer our courses to learners in these countries and regions, the licenses we have received are not broad enough to allow us to offer this course in all locations. edX truly regrets that U.S. sanctions prevent us from offering all of our courses to everyone, no matter where they live.
Who can take this course?
Unfortunately, learners residing in one or more of the following countries or regions will not be able to register for this course: Iran, Cuba and the Crimea region of Ukraine. While edX has sought licenses from the U.S. Office of Foreign Assets Control (OFAC) to offer our courses to learners in these countries and regions, the licenses we have received are not broad enough to allow us to offer this course in all locations. edX truly regrets that U.S. sanctions prevent us from offering all of our courses to everyone, no matter where they live.